Clean Room Information
PrintFriendly
Equipment Status
Click here to view instrument repair status
Established Process Recipes
Mask Aligner
AZP4620 resist process
SU8-2050 resist process
S1805 resist process
Heidelberg Laser writer
AZ 1500 resist process
AZP4620 resist process
KL IR 15 resist process
S1805 resist process
AutoCAD Guidelines
Mask Preparation
AutoCAD alignment template
Guidelines for FS/BS alignment marks
Oxford ICP/RIE
Bosch Si etch performance
Si etch (continuous etch) performance
SiO2 etch performance
SiN etch performance
Repeatability tests
Resist etch rate (O2 plasma)
Oxford Nanofab/PECVD
SiO2 deposition
SiN deposition
Poly-Si deposition
Miscellaneous Processes
Lift-off process with KLIR 15 Resist
Lift-off process with LOR10B/S1805 Resist
PDMS Process
Glass etching in HF
Annual Clean Room Training Requirements
Review the safety presentation
Read relevant Chemical Safety Data Sheets
Complete the online quiz and inform Lab Manager
Safety Manuals/Presentations
Clean Room Safety Manual
Clean Room Safety Presentation
Clean Room After Hours Policy: All after-hours work including weekends and holidays should be approved by 3 PM. All requests for after hours use should be submitted online via After Hours Clean Room Use Form. Emails sent after 3 PM will not be reviewed until the next working day. To gain after hours access to the clean room you will need to check out a swipe card from either Rahul Gupta (Rudolph L27A) or Beth Gartin (Rudolph L52). Swipe cards must be returned the following business day or the user will be charged a $25 "lost card" fee.