Clean Room Information
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Established Process Recipes
Mask Aligner
AZP4620 resist process
SU8-2050 resist process
S1805 resist process
Heidelberg Laser writer
AZ 1500 resist process
AZP4620 resist process
KL IR 15 resist process
S1805 resist process
AutoCAD Guidelines
Mask Preparation
AutoCAD alignment template
Guidelines for FS/BS alignment marks
Oxford ICP/RIE
Bosch Si etch performance
SiO2 etch performance
SiN etch performance
Repeatability tests
Oxford Nanofab/PECVD
SiO2 deposition
SiN deposition
Poly-Si deposition
Miscellaneous Processes
Lift-off process with KLIR 15 Resist
Lift-off process with LOR10B/S1805 Resist
PDMS Process
Glass etching in HF
Annual Clean Room Training Requirements
Review the safety presentation
Complete the online quiz and inform Lab Manager
Safety Manuals/Presentations
Clean Room Safety Manual
Clean Room Safety Presentation
Clean Room After Hours Policy:
All after-hours work including weekends and holidays should be approved by 5 PM. Forms should be submitted in person as much as possible. If forms are sent by email rgupta24@wustl.edu, work should not be performed unless confirmation has been granted. Emails sent after 5 PM will not be reviewed until the next working day. After Hours Clean Room Use Form